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dc.contributor.authorHelal, Hicham
dc.contributor.authorBenamara, Zineb
dc.contributor.authorWederni, Mouhamed Amine
dc.contributor.authorMourad, Sabrine
dc.contributor.authorKhirouni, Kamel
dc.contributor.authorMonier, Guillaume
dc.contributor.authorRobert-Goumet, Christine
dc.contributor.authorRabehi, Abdelaziz
dc.contributor.authorKacha, Arslane Hatem
dc.contributor.authorBakkali, Hicham 
dc.contributor.authorCervera Gontard, Lionel 
dc.contributor.authorDomínguez de la Vega, Manuel 
dc.contributor.otherFísica de la Materia Condensadaes_ES
dc.date.accessioned2021-12-09T08:11:09Z
dc.date.available2021-12-09T08:11:09Z
dc.date.issued2021-10-09
dc.identifier.issn1996-1944
dc.identifier.urihttp://hdl.handle.net/10498/25830
dc.description.abstractAu/0.8 nm–GaN/n–GaAs Schottky diodes were manufactured and electrically characterized over a wide temperature range. As a result, the reverse current Iinv increments from 1 x 10^-7 A at 80 K to about 1 x 10^-5 A at 420 K. The ideality factor n shows low values, decreasing from 2 at 80 K to 1.01 at 420 K. The barrier height q b grows abnormally from 0.46 eV at 80 K to 0.83 eV at 420 K. The tunnel mechanism TFE effect is responsible for the qfi_b behavior. The series resistance Rs is very low, decreasing from 13.80 W at 80 K to 4.26 W at 420 K. These good results are due to the good quality of the interface treated by the nitridation process. However, the disadvantage of the nitridation treatment is the fact that the GaN thin layer causes an inhomogeneous barrier height.es_ES
dc.formatapplication/pdfes_ES
dc.language.isoenges_ES
dc.publisherMDPIes_ES
dc.rightsAttribution-NonCommercial-NoDerivatives 4.0 Internacional*
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/*
dc.sourceMaterials - 2021, Vol. 14, pp. 5909(12)es_ES
dc.subjectConduction mechanismses_ES
dc.subjectSchottky diodees_ES
dc.subjectGaNes_ES
dc.subjectn-GaAses_ES
dc.subjectNitridationes_ES
dc.subjectBarrier heightes_ES
dc.subjectI-V-Tes_ES
dc.titleConduction Mechanisms in Au/0.8 nm–GaN/n–GaAs Schottky Contacts in a Wide Temperature Rangees_ES
dc.typejournal articlees_ES
dc.rights.accessRightsopen accesses_ES
dc.description.physDesc12 páginases_ES
dc.identifier.doi10.3390/ma14205909
dc.relation.projectIDinfo:eu-repo/grantAgreement/AEI/Plan Estatal de Investigación Científica y Técnica y de Innovación 2017-2020/EQC2018-004704-P/ES/Modernización del Servicio de Microscopía deFuerza Atómica (AFM) del IMEYMATes_ES


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Attribution-NonCommercial-NoDerivatives 4.0 Internacional
This work is under a Creative Commons License Attribution-NonCommercial-NoDerivatives 4.0 Internacional