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dc.contributor.authorNawa, Kenji
dc.contributor.authorKepaptsoglou, Demie
dc.contributor.authorGhasemi, Arsham
dc.contributor.authorHasnip, Philip
dc.contributor.authorBarcena González, Guillermo 
dc.contributor.authorNicotra, Giuseppe
dc.contributor.authorGalindo Riaño, Pedro Luis 
dc.contributor.authorRamasse, Quentin M.
dc.contributor.authorNakamura, Kohji
dc.contributor.authorSpeller, Susannah C.
dc.contributor.authorKuerbanjiang, Balati
dc.contributor.authorHesjedal, Thorsten
dc.contributor.authorLazarov, Vlado K.
dc.contributor.otherIngeniería Informáticaes_ES
dc.date.accessioned2024-04-26T09:33:56Z
dc.date.available2024-04-26T09:33:56Z
dc.date.issued2021-02-12
dc.identifier.issn2475-9953
dc.identifier.urihttp://hdl.handle.net/10498/32001
dc.description.abstractWe present a structural and density-functional theory study of the interface of the quasi-twin-free grown three-dimensional topological insulator Bi2Te3 on Ge(111). Aberration-corrected scanning transmission electron microscopy and electron energy-loss spectroscopy in combination with first-principles calculations show that the weak van der Waals adhesion between the Bi2Te3 quintuple layer and Ge can be overcome by forming an additional Te layer at their interface. The first-principles calculations of the formation energy of the additional Te layer show it to be energetically favorable as a result of the strong hybridization between the Te and Ge.es_ES
dc.formatapplication/pdfes_ES
dc.language.isoenges_ES
dc.rightsAttribution-NonCommercial-NoDerivatives 4.0 Internacional*
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/*
dc.sourcePHYSICAL REVIEW MATERIALS 5, 024203 (2021)es_ES
dc.titleModification of the van derWaals interaction at the Bi2Te3 and Ge(111) interfacees_ES
dc.typejournal articlees_ES
dc.rights.accessRightsopen accesses_ES
dc.identifier.doi10.1103/PhysRevMaterials.5.024203
dc.type.hasVersionVoRes_ES


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Attribution-NonCommercial-NoDerivatives 4.0 Internacional
Esta obra está bajo una Licencia Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 Internacional