RT journal article T1 Electronic and physico-chemical properties of nanmetric boron delta-doped diamond structures A1 Chicot, Gauthier A1 Fiori, A A1 Volpe, Pierre Nicola A1 Tran Thi, T.N. A1 Gerbedoen, J.C. A1 Bousquet, J A1 Alegre Salguero, María de la Paz A1 Piñero Charlo, José Carlos A1 Araújo Gay, Daniel A1 Jomard, F A1 Soltani, A A1 Morse, J A1 Härtwing, J A1 Tranchant, N A1 Mer-Calfati, C A1 Arnault, J. C. A1 Eon, D. A1 Omnés, F A1 Pernot, Julien A1 Bustarret, Etienne A1 Delahaye, J A1 Grenet, T A2 Ciencia de los Materiales e Ingeniería Metalúrgica y Química Inorgánica K1 delta K1 doped diamond K1 electronic properties AB Heavily boron doped diamond epilayers with thicknesses ranging from 40 to less than 2 nm and buried between nominally undoped thicker layers have been grown in two different reactors. Two types of [100]-oriented single crystal diamond substrates were used after being characterized by X-ray white beam topography. The chemical composition and thickness of these so-called deltadoped structures have been studied by secondary ion mass spectrometry, transmission electron microscopy, and spectroscopic ellipsometry. Temperature-dependent Hall effect and four proberesistivity measurements have been performed on mesa-patterned Hall bars. The temperature dependence of the hole sheet carrier density and mobility has been investigated over a broad temperature range (6K