RT journal article
T1 Fabrication of gas amplification microstructures with SU8 photosensitive epoxy
A1 Key, M.J.
A1 Llobera, A.
A1 Lozano, M.
A1 Ramos Lerate, Inmaculada Concepción
A1 Seidemann, V.
A2 Física Aplicada
K1 Gas micropattern detectors
K1 MEMS
K1 SU8
K1 MSGC
K1 Microwell
AB Recent advances in the field ofmicroelectromechanical systems (MEMS) research can be applied to the fabrication of gaseous electron-multiplying microstructures for use in imaging radiation sensors, and show interesting possibilities in addressing problems encountered with the gas micropattern generation ofradiation detectors in some applications, for example, gain instability and electrical breakdowns in high photon fluxes. The use ofSU8, an epoxy-based photoresist finding increasing use in MEMS and micromachining applications, is briefly discussed with regard to the construction of gas micropattern detectors, and several devices fabricated with the material are presented. Processes using the material can be adapted to a range ofdetector geometries, and the ability to fabricate higher level multilayer structures may also allow the incorporation ofadditional features such as guard electrodes to protect detectors and associated readout electronics against damaging spark events.
PB ELSEVIER SCIENCE BV, PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS
SN 0168-9002
YR 2004
FD 2004
LK http://hdl.handle.net/10498/30128
UL http://hdl.handle.net/10498/30128
LA eng
DS Repositorio Institucional de la Universidad de Cádiz
RD 13-nov-2026