RT journal article
T1 Analysis of electron beam damage of exfoliated MoS2 sheets and quantitative HAADF-STEM imaging
A1 García, Alejandra
A1 Raya, Andrés M.
A1 Mariscal, Marcelo M.
A1 Esparza, Rodrigo
A1 Herrera Collado, Miriam
A1 Molina Rubio, Sergio Ignacio
A1 Scavello, Giovanni
A1 Galindo Riaño, Pedro Luis
A1 Jose-Yacaman, Miguel
A1 Ponce, Arturo
A2 Ciencia de los Materiales e Ingeniería Metalúrgica y Química Inorgánica
A2 Ingeniería Informática
K1 Low-voltage transmission electron microscopy
K1 Aberration-corrected microscopy
K1 Molybdenum disulfide
K1 Radiation damage
AB In this work we examined MoS2 sheets by aberration-corrected scanning transmission electron microscopy (STEM) at three different energies: 80, 120 and 200 kV. Structural damage of the MoS2 sheets has been controlled at 80 kV according a theoretical calculation based on the inelastic scattering of the electrons involved in the interaction electron–matter. The threshold energy for the MoS2 material has been found and experimentally verified in the microscope. At energies higher than the energy threshold we show surface and edge defects produced by the electron beam irradiation. Quantitative analysis at atomic level in the images obtained at 80 kV has been performed using the experimental images and via STEM simulations using SICSTEM software to determine the exact number of MoS2 layers.
PB Elsevier
SN 1879-2723
YR 2014
FD 2014-06-02
LK http://hdl.handle.net/10498/33467
UL http://hdl.handle.net/10498/33467
LA eng
DS Repositorio Institucional de la Universidad de Cádiz
RD 11-nov-2026