TY  - GEN 
AU  - Bartsch, Heike
AU  - Grieseler, Rolf
AU  - Manuel Delgado, José Manuel
AU  - Pezoldt, Jörg
AU  - Müller 1, Jens
A4  - Física de la Materia Condensada
PY  - 2018
SN  - 2079-6412
UR  - http://hdl.handle.net/10498/32945
AB  - This work compares the deposition of aluminum nitride by magnetron sputtering on silicon to multilayer ceramic substrates. The variation of sputter parameters in a wide range following a fractional factorial experimental design generates diverse...
LA  - eng
PB  - MDPI
KW  - low temperature cofired ceramics
KW  - LTCC
KW  - aluminum nitride
KW  - high-rate magnetron sputtering
KW  - stress reduction
KW  - substrate influence on nucleation
KW  - cubic aluminum nitride
TI  - Magnetron sputtered AlN layers on LTCC multilayer and silicon substrates
DO  - 10.3390/coatings8080289
ER  -