TY  - GEN 
AU  - Ruiz-Clavijo, Alejandra
AU  - Bahrami, Amin
AU  - Charvot, Jaroslav
AU  - Lehmann, Sebastian
AU  - Julin, Jaakko
AU  - Wolf, Daniel
AU  - Giebeler, Lars
AU  - Wrzesińska Lashkova, Angelika
AU  - Pieck, Fabian
AU  - Outón Porras, Javier
AU  - Tonner-Zech, Ralf
AU  - Bureš, Filip
AU  - Vaynzof, Yana
AU  - Blanco Ollero, Eduardo
AU  - Nielsch, Kornelius
A4  - Física Aplicada
A4  - Física de la Materia Condensada
PY  - 2026
SN  - 2199-160X
UR  - http://hdl.handle.net/10498/39317
AB  - Low-temperature atomic layer deposition (ALD) is increasingly important for the integration of layered metal dichalcogenides such as tin diselenide (SnSe2) into advanced nanoelectronic devices, where compatibility with temperature-sensitive substrates...
LA  - eng
PB  - John Wiley and Sons Inc
KW  - 2D materials
KW  - low temperature ALD
KW  - SnSe2
KW  - thin film
KW  - transport properties
TI  - Thickness-Driven Modulation of Electronic Transport in SnSe2-grown Films by Low-Temperature Atomic Layer Deposition
DO  - 10.1002/AELM.202500560
ER  -