Critical boron-doping levels for generation of dislocations in synthetic diamond
MetadataShow full item record
DepartmentCiencia de los Materiales e Ingeniería Metalúrgica y Química Inorgánica
SourceApplied physics letters 105 (2014) 173103
Defects induced by boron doping in diamond layers were studied by transmission electron microscopy. The existence of a critical boron doping level above which defects are generated is reported. This level is found to be dependent on the CH4 /H2 molar ratios and on growth directions. The critical boron concentration lied in the 6.5–17.0 X 10 20 at/cm3 range in the <111> direction and at 3.2 X 1021 at/cm 3 for the <001> one. Strain related effects induced by the doping are shown not to be responsible. From the location of dislocations and their Burger vectors, a model is proposed, together with their generation mechanism.