Local boron doping quantification in homoepitaxial diamond structures

Identificadores
URI: http://hdl.handle.net/10498/17161
DOI: 10.1016/j.diamond.2010.02.043
ISSN: 0925-9635
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2010-03-01Departamento/s
Ciencia de los Materiales e Ingeniería Metalúrgica y Química InorgánicaFuente
Diamond and Related Materials 19 (2010) 972-975Resumen
The capability of transmission electronmicroscopy (TEM) using the high angle annular dark fieldmode (HAADF,also labelled Z-contrast) to quantify boron concentration, in the high doping range between 1019cm−3 and 1021cm−3, is demonstrated. Thanks to the large relative variation of atomic number Z between carbon and boron, doping concentration maps and profiles are obtained with a nanometer-scale resolution. A novel numerical simulation procedure allows the boron concentration quantification and demonstrates the high sensitivity and
spatial resolution of the technique.
Materias
Diamond; TEM; homoepitaxy; HAADF; Boron dopingColecciones
- Artículos Científicos [12009]
- Articulos Científicos CC. Mat. [579]
- Artículos Científicos IMEYMAT [578]





