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Conduction Mechanisms in Au/0.8 nm–GaN/n–GaAs Schottky Contacts in a Wide Temperature Range

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URI: http://hdl.handle.net/10498/25830

DOI: 10.3390/ma14205909

ISSN: 1996-1944

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Author/s
Helal, Hicham; Benamara, Zineb; Wederni, Mouhamed Amine; Mourad, Sabrine; Khirouni, Kamel; Monier, Guillaume; Robert-Goumet, Christine; Rabehi, Abdelaziz; Kacha, Arslane Hatem; Bakkali, HichamAuthority UCA; Cervera Gontard, LionelAuthority UCA; Domínguez de la Vega, ManuelAuthority UCA
Date
2021-10-09
Department
Física de la Materia Condensada
Source
Materials - 2021, Vol. 14, pp. 5909(12)
Abstract
Au/0.8 nm–GaN/n–GaAs Schottky diodes were manufactured and electrically characterized over a wide temperature range. As a result, the reverse current Iinv increments from 1 x 10^-7 A at 80 K to about 1 x 10^-5 A at 420 K. The ideality factor n shows low values, decreasing from 2 at 80 K to 1.01 at 420 K. The barrier height q b grows abnormally from 0.46 eV at 80 K to 0.83 eV at 420 K. The tunnel mechanism TFE effect is responsible for the qfi_b behavior. The series resistance Rs is very low, decreasing from 13.80 W at 80 K to 4.26 W at 420 K. These good results are due to the good quality of the interface treated by the nitridation process. However, the disadvantage of the nitridation treatment is the fact that the GaN thin layer causes an inhomogeneous barrier height.
Subjects
Conduction mechanisms; Schottky diode; GaN; n-GaAs; Nitridation; Barrier height; I-V-T
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Attribution-NonCommercial-NoDerivatives 4.0 Internacional
This work is under a Creative Commons License Attribution-NonCommercial-NoDerivatives 4.0 Internacional

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